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Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase

operational conditions: total gas flow rate, gas pressure, and plasmas generated with SF6 and CF4 mixtures or mixed separately with

of Si and WSiN using ECR plasma of SF6-CF4 gas mixture

Anisotropic etching of Si and WSiN using ECR plasma of SF6-CF4 gas mixture on ResearchGate, the professional network for scientists. Anisotropic etchin

Characterization and antimicrobial properties of fluorine-

The films deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

I Observed And Calculated Thermal Expansions Of Sf6 Cf4

electron diffraction studies of hot molecules. i. observed and calculated thermal expansions of sf6, cf4, and sif4 a new method is described for the r

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

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Comparison of SF6 and CF4 Plasma Treatment for Surface Hydro

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This paper deals with the measurement of the mobility of negative ions in the mixtures of SF6 with CF4 and the CH4-Ar (50:50) binary mixture with

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Solubility of Gases in Binary Liquid Mixtures: An Experimental and CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2,

Solubility of gases in liquids. 12 Solubility of He, Ne, Ar,

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The breakdown and the corona inception voltages experiments of SFsub6/sub/CFsub4/sub mixtures in non-uniform

Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SFsub6/sub gas has excellent dielectric strength, but it causes global warming about 23900 times more than COsub2/

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【LRC】Decomposition of Potent Greenhouse Gases SF6, CF4 and SF5CF3

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Eight Single Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6

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A comparative ab initio study of SF6⋯X- and CF4⋯X-

levels are used to analyze the interaction between SF6 and CF4 neutral molecules and anions, X- (X = H, F, Cl, CN, NC, N3, NCO) in gas