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gases in liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2

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Eight Single Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6

Gases He, N2, O2, Xe, CO2, CH4, CF4, and SF6 at Two Film gas mixture density heat capacity forced convective heat transfer heat transfer

Gases in Liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2

Solubility of Gases in Liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2, O2, CH4, CF4, and SF6 in Normal 1-Alkanols n-ClH2l+lOH (1

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2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

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1- Interruption Capability and Decomposed Das Density of CF3I as a Substitute for SF6 Gas.2- Electrical Breakdown of CF3I and CF3I-N2 Gas Mixture

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2, D2, N2, CH4

On Aug 2, 1993 F. Gibanel (and others) published: Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2, D2, N2, CH4, C2H4, C2H6,

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

2015311-Get this from a library! Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~, CH4~, C2~H4~, C2~H6~, CF4~ and SF6~

of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2,

Solubility of Gases in Liquids. 21. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in 2,2,4-Trimethylpentane at

Characterization and antimicrobial properties of fluorine-

The films deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

Properties of Binary Gas Mixtures of CH4, CF4, SF6, and C(

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

Solubility of Gases in Liquids. 17. The Solubility of He, Ne

Solubility of Gases in Liquids. 17. The Solubility of He, Ne, Ar, Kr, H2, N2, O2, CO, CH4, CF4, and SF6 in Tetrachloromethane at 283-318

Comparison of SF6 and CF4 Plasma Treatment for Surface Hydro

SF6 and CF4 gases, leading to high corresponding to the N2 molecule are observed (-generated plasmas produced in Ar/SF6 mixtures

in the dielectric strength of SF6+CF4+Ar mixtures (a) 40%

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gases in liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2

Solubility of Gases in Binary Liquid Mixtures: An Experimental and 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in

Solubilities of gases in liquids 11. The solubilities of He,

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C2CL2F3CF4CF2CL2C2F6SF6-N2CCL2F2CF3CF2CLC4F8

SFsub6/sub gas has excellent dielectric strength, but it causes global warming about 23900 times more than COsub2/

of Si and WSiN using ECR plasma of SF6-CF4 gas mixture

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gases in liquids. 12 Solubility of He, Ne, Ar, Kr, O2, N2,

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of Gases in Liquids. 20. Solubility of He, Ne, Ar, Kr, N2,

The Ostwald coefficients L2,1 of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, 6 ≤ l

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

TRAFAG SF6 CF4 SF6_

Solubility measurements of several non-polar gases (He, Ne, Ar, Kr, Xe, H2, D2, N2, O2, CH4, C2H4, C2H6, CF4, SF6 and CO2) in

of gases in liquids 9. Solubility of He, Ne, Ar, Kr, N2,

Publication » The solubility of gases in liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some dimethyl

SF_6/N_2SF_6/CF_4-

Contact Us For Cardiff Authors User Area Login How to Add Research How to Add a Research Thesis Copyright FAQ Insulation strength of CF

- Reactive ion etching of SiC in SF6 gas: detection of CF,

Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

Grid as An Eco-Friendly Alternative Insulation Gas to SF6:

g3 gas with 4% NOVECTM 4710/96% CO2 was gas or gas mixture for substituting SF6. Trifluoroiodomethane (CF3I) has been introduced